(a)
(b)
(c)
Figure 2: Schematic of nanoimprint process on sol-gel silica core. (a) Si master stamp was dry-etched for patterning after electron beam (EB) resist was EB-radiated and developed in a developer. (b) Si master stamp was pressed on polydimethylsilane (PDMS) and baked while maintaining equal spacing with the spacers. After baking, the PDMS stamp was duplicated. (c) The PMDS stamp was attached and pressed on the sol-gel silica core. The sol-gel silica core was nanopatterned when the PDMS stamp was pressed on the core and irradiated with UV light. Finally, the PDMS stamp was removed and baked.