Journal of Spectroscopy / 2013 / Article / Tab 1

Research Article

Optical Characterization of Porous Sputtered Silver Thin Films

Table 1

Effective plasma frequency depending on the deposition parameters.

Current (mA)Pressure (Pa)Thickness (nm)Plasma Frequency (eV)

20 3.5225.55
408225.74
403.5267.38
403.5508.04
403.51068.91

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