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Journal of Spectroscopy
Volume 2016 (2016), Article ID 9509043, 7 pages
http://dx.doi.org/10.1155/2016/9509043
Research Article

Thickness Measurement of V2O5 Nanometric Thin Films Using a Portable XRF

1Laboratório de Física Nuclear Aplicada, Departamento de Física, Universidade Estadual de Londrina, Campus Universitário, Caixa Postal 10011, 86057-970 Londrina, PR, Brazil
2Laboratório de Filmes Finos e Materiais, Departamento de Física, Universidade Estadual de Londrina, Campus Universitário, Caixa Postal 10011, 86057-970 Londrina, PR, Brazil
3Instituto di Matematica e Fisica, Università degli Studi di Sassari, Via Viena 2, 07100 Sassari, Italy

Received 30 September 2015; Revised 9 December 2015; Accepted 14 December 2015

Academic Editor: Jisheng Pan

Copyright © 2016 Fabio Lopes et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

Abstract

Nanometric thin films have always been chiefly used for decoration; however they are now being widely used as the basis of high technology. Among the various physical qualities that characterize them, the thickness strongly influences their properties. Thus, a new procedure is hereby proposed and developed for determining the thickness of V2O5 nanometric thin films deposited on the glass surface using Portable X-Ray Fluorescence (PXRF) equipment and the attenuation of the radiation intensity Kα of calcium present in the glass. It is shown through the present paper that the radiation intensity of calcium Kα rays is proportional to film thickness in nanometric films of vanadium deposited on the glass surface.