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Journal of Spectroscopy
Volume 2016 (2016), Article ID 9509043, 7 pages
http://dx.doi.org/10.1155/2016/9509043
Research Article

Thickness Measurement of V2O5 Nanometric Thin Films Using a Portable XRF

1Laboratório de Física Nuclear Aplicada, Departamento de Física, Universidade Estadual de Londrina, Campus Universitário, Caixa Postal 10011, 86057-970 Londrina, PR, Brazil
2Laboratório de Filmes Finos e Materiais, Departamento de Física, Universidade Estadual de Londrina, Campus Universitário, Caixa Postal 10011, 86057-970 Londrina, PR, Brazil
3Instituto di Matematica e Fisica, Università degli Studi di Sassari, Via Viena 2, 07100 Sassari, Italy

Received 30 September 2015; Revised 9 December 2015; Accepted 14 December 2015

Academic Editor: Jisheng Pan

Copyright © 2016 Fabio Lopes et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

How to Cite this Article

Fabio Lopes, Luís Henrique Cardozo Amorin, Larissa da Silva Martins, Alexandre Urbano, Carlos Roberto Appoloni, and Roberto Cesareo, “Thickness Measurement of V2O5 Nanometric Thin Films Using a Portable XRF,” Journal of Spectroscopy, vol. 2016, Article ID 9509043, 7 pages, 2016. doi:10.1155/2016/9509043