Table of Contents
Laser Chemistry
Volume 13, Issue 2, Pages 113-119

The Potential of Vacuum Ultraviolet Photoionization Mass Spectrometry in Monitoring Photofragmentation of Organometallics

Foundation for Research and Technology—Hellas Institute of Electronic Structure and Laser, P.O. Box 1527, Heraklion, Crete GR 71110, Greece

Received 10 October 1992

Copyright © 1993 Hindawi Publishing Corporation. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.


The paper examines the potential of vacuum ultraviolet (VUV) photoionization mass spectroscopy in probing the fragmentation of organometallics in molecular-beam studies and laser-assisted deposition processes. To this end, the ionic fragmentation pattern of few common organometallics, namely metallocenes and carbonyls, is examined at selected VUV wavelengths, produced by microwave-discharge resonance atomic lamps. Discussion of the recorded spectra in terms of the electronic structure of the compounds indicates lack of dynamical bias in the VUV photoionization/fragmentation of metal complexes. Excitation with VUV light results in simpler ionic fragmentation patterns than what observed with electron-impact ionization, thereby enabling accurate monitoring of the excimer-laser photodissociation of organometallics. Finally, the intensity of the VUV ionic signal appears to be adequate for molecular-beam studies. An illustrative example is provided for the study of the 248nm-induced photodesorption of Mo(CO)6 from cryogenic films.