Processing of Dielectric Optical Coatings by Nanosecond and Femtosecond UV Laser Ablation

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</svg>-multilayer
 stack on fused silica, front-side ablation, 248 nm, 500 femtoseconds,
 multipulse irradiation.</table>

Laser Chemistry

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Figure 8

Figure 8: Processing of Dielectric Optical Coatings by Nanosecond and Femtosecond UV Laser Ablation 