Oxide Thin Film Heterostructures on Large Area, with Flexible Doping, Low Dislocation Density, and Abrupt Interfaces: Grown by Pulsed Laser Deposition

Figure 33

Atomic Force Microscopy (AFM) image of a typical STO(100) substrate surface after etching and heat treatment, with unit cell steps of 3.9 Å height. Below are the corresponding RHEED surface images taken in [011] and [001] directions.

(a)

(b)