The Wavelength-Locking of High-Power 808 nm Semiconductor Laser

Figure 2

Holographic optical path of the exposure. (1) 325 nm laser; (2) sampling mirror; (3) power detector; (4) exposure switch; (5) half mirror; (6) piezoelectric ceramic reflector; (7) total reflection mirror; (8) UV beam expander; (9) collimating lens; (10) workpiece support; (11) CCD; (12) control computer.