Research Article

Coupling and Shielding Properties of the Baffle in ICP System

Figure 4

Chevron slot structure combined with thin blade: (a) cross-section of the structure, (b) actual photo of clean deposition baffle-side exposed to the metal containing plasma, (c) cumulative deposit traces on the testing wafer, and (d) actual profile and thickness of the cumulative deposition on the wafer (calculated from sheet resistance of the metallic film).
541743.fig.004a
(a)
541743.fig.004b
(b)
541743.fig.004c
(c)
541743.fig.004d
(d)