Table of Contents
Physics Research International
Volume 2010, Article ID 164249, 14 pages
Review Article

Inductively Coupled Plasma Sources and Applications

Production Engineering Laboratory, Panasonic Corporation, 2-7, Matsuba-Cho, Kadoma, Osaka 571-8502, Japan

Received 22 October 2010; Accepted 30 December 2010

Academic Editor: Lorenzo Pavesi

Copyright © 2010 Tomohiro Okumura. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.


The principle of inductively coupled plasma (ICP) and perspective of ICP development are reviewed. Multispiral coil ICP (MSC-ICP), which has the advantages of low inductance, high efficiency, and excellent uniformity, is discussed in detail. Applications to thin film processing technologies and the future prospects of ICP are also described.