Table of Contents
Physics Research International
Volume 2012 (2012), Article ID 249495, 11 pages
http://dx.doi.org/10.1155/2012/249495
Research Article

Development of Laser-Produced Tin Plasma-Based EUV Light Source Technology for HVM EUV Lithography

1EUV Development Division, Gigaphoton Inc., 400 Oaza Yokokurashinden Oyama-shi, Tochigi-ken 323-8558, Japan
2EUV Development Division, Gigaphoton Inc., 3-25-1 Shinomiya Hiratsuka-shi, Kanagawa-ken 254-8555, Japan

Received 10 May 2012; Accepted 20 June 2012

Academic Editor: Sergi Gallego

Copyright © 2012 Junichi Fujimoto et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

How to Cite this Article

Junichi Fujimoto, Tsukasa Hori, Tatsuya Yanagida, and Hakaru Mizoguchi, “Development of Laser-Produced Tin Plasma-Based EUV Light Source Technology for HVM EUV Lithography,” Physics Research International, vol. 2012, Article ID 249495, 11 pages, 2012. doi:10.1155/2012/249495