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Editorial Board

Chief Editor

  • Guosong Wu, Hohai University, China

    Associate Editors

    • Richard Arinero , Université de Montpellier, France
    • Daniele Passeri , Università di Roma Sapienza, Italy
    • Andrea Picone , Politecnico di Milano, Italy

      Academic Editors

      • David Alsteens, Université Catholique de Louvain, Belgium
      • Igor Altfeder , University of Dayton, USA
      • Jose Alvarez , Centre National de la Recherche Scientifique, France
      • Lavinia C. Ardelean , Faculty of Dentistry, University of Medicine and Pharmacy Victor Babes from Timisoara, Romania
      • Renato Buzio , Consiglio Nazionale delle Ricerche, Italy
      • J. Chen, Western University, Canada
      • Ovidiu Cretu , National Institute for Materials Science, Japan
      • Nicolas Delorme , Université du Maine, France
      • Hendrix Demers , McGill University, Canada
      • Jonathan R. Felts, Texas A and M University, USA
      • Marina I. Giannotti, CIBER-BBN/University of Barcelona, Spain
      • Federico Grillo , University of St. Andrews, United Kingdom
      • Anton V. Ievlev , Oak Ridge National Laboratory, USA
      • Heng Bo Jiang , Shandong First Medical University, China
      • Berndt Koslowski , Ulm University, Germany
      • Jessem Landoulsi , University Pierre & Marie Curie, France
      • Jason L. Pitters , National Research Council of Canada, Canada
      • Michela Relucenti , Università di Roma, Italy
      • Francesco Ruffino , University of Catania, Italy
      • Senthil Kumaran Selvaraj , Vellore Institute of Technology (VIT), India
      • Stefan G. Stanciu, University Politehnica of Bucharest, Center for Microscopy-Microanalysis and Information Processing, Bucharest, Romania
      • Andreas Stylianou , University of Cyprus, Cyprus
      • Christian Teichert , University of Leoben, Austria
      • Marilena Vivona , ORC, University of Southampton, United Kingdom
      • Shuilin Wu, Tianjin University, China
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        Acceptance rate15%
        Submission to final decision126 days
        Acceptance to publication17 days
        CiteScore2.500
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