539457.fig.006
Figure 6: Schematic side view of the PEO-b-PS diblock copolymer with different initial thickness developed on the Si wafer under thermal annealing. A polymer brush was formed in the film of thickness less than 6.2 nm. When the film is thicker than 6.2 nm, a dense polymer brush equal to half of an interlamellar layer ( ) was formed, and the excess material dewets this layer to form droplets. The PEO block can crystallize to form spherulite in the bigger droplets.