Photoresponsive Wettability in Monolayer Films from Sinapinic Acid

<table class="table-group" id="tab2"><tr><td><table class="table"><tr><td class="thead-hr" colspan="2"><hr/></td></tr><tr class="thead"><td align="left">Time (h)</td><td align="center">RMS roughness (nm)</td></tr><tr><td class="thead-hr" colspan="2"><hr/></td></tr><tr><td align="left">0</td><td align="center">0.58</td></tr><tr><td align="left">15</td><td align="center">1.47</td></tr><tr><td align="left">24</td><td align="center">4.54</td></tr><tr class="table-tr"><td colspan="2"><hr class="tbody-hr"/></td></tr></table></td></tr></table>

Mean diameter, root-mean-square (RMS) roughness for SinA monolayer at different times of UV irradiation.

The Scientific World Journal

tab2

Table 2

Table 2: Photoresponsive Wettability in Monolayer Films from Sinapinic Acid 