Research Article

Growth and Etch Rate Study of Low Temperature Anodic Silicon Dioxide Thin Films

Table 2

Refractive index of the oxide films developed in potentiodynamic mode.

Regime: potentiodynamic, pH = 4
Current density (mA/cm2)Water content (vol%)Refractive index ( )

5.501.4755
801.4756
5.50.21.4748
80.21.4749
5.50.71.4747
80.71.4752