Sputtered Pd as Hydrogen Storage for a Chip-Integrated Microenergy System

Table 3

Electrochemically active surface (𝑆_𝐴) and roughness factor (𝑓) of Pd films deposited at various 𝑝_Ar calculated from the cyclic voltammeter curves.

𝑝Ar (mbar)	𝑆𝐴 (cm^2)	𝑓
5⋅10^−3	11.5	5.8
1⋅10^−2	20.3	10.2
2⋅10^−2	27.2	13.7
4⋅10^−2	27.6	13.9
8⋅10^−2	46.5	23.4
1⋅10^−1	48.9	24.6