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The Scientific World Journal
Volume 2014 (2014), Article ID 239261, 8 pages
http://dx.doi.org/10.1155/2014/239261
Research Article

Enhanced Temperature Control Method Using ANFIS with FPGA

1Department of Electronic Engineering, Chien Hsin University of Science and Technology, Jhongli 320, Taiwan
2Department of Computer Science and Information Engineering, National University of Kaohsiung, Kaohsiung 811, Taiwan
3Department of Electrical Engineering, Chung Yuan Christian University, Jhongli 320, Taiwan

Received 31 August 2013; Accepted 22 January 2014; Published 4 March 2014

Academic Editors: G. Litak, F. Liu, and B. Yasilata

Copyright © 2014 Chiung-Wei Huang et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

Abstract

Temperature control in etching process is important for semiconductor manufacturing technology. However, pressure variations in vacuum chamber results in a change in temperature, worsening the accuracy of the temperature of the wafer and the speed and quality of the etching process. This work develops an adaptive network-based fuzzy inference system (ANFIS) using a field-programmable gate array (FPGA) to improve the effectiveness. The proposed method adjusts every membership function to keep the temperature in the chamber stable. The improvement of the proposed algorithm is confirmed using a medium vacuum (MV) inductively-coupled plasma- (ICP-) type etcher.