Table of Contents
VLSI Design
Volume 6, Issue 1-4, Pages 393-397
http://dx.doi.org/10.1155/1998/65787

A Compound Semiconductor Process Simulator and its Application to Mask Dependent Undercut Etching

1NTT Opto-electronics Laboratories, Atsugi-shi, Japan
2NTT LSI Laboratories, Atsugi-shi, Japan

Copyright © 1998 Hindawi Publishing Corporation. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

How to Cite this Article

Masami Kumagai, Kiyoyuki Yokoyama, and Satoshi Tazawa, “A Compound Semiconductor Process Simulator and its Application to Mask Dependent Undercut Etching,” VLSI Design, vol. 6, no. 1-4, pp. 393-397, 1998. https://doi.org/10.1155/1998/65787.