Research Article
Line Search-Based Inverse Lithography Technique for Mask Design
Table 1
Pattern and runtime comparison between [
16] and ours.
| | No. | Mask size (pixel) | Pixel size (nm) | Feature size (nm) | Pattern error | Runtime (s) | | [16] | (%) | [16] with our runtime | (%) | Ours | [16] | (%) | Ours |
| | 1 | 184 × 184 | 5.625 | 45 | 1512 | (9.88) | 1566 | (13.81) | 1376 | 192 | (−49.61) | 381 | | 2 | 400 × 400 | 5.625 | 45 | 3308 | (24.17) | 3780 | (41.89) | 2664 | 13337 | (13.24) | 11778 | | 3 | 2000 × 2000 | 5.625 | 45 | 108144 | (8.55) | 109267 | (9.68) | 99624 | 17918 | (−0.38) | 17986 | | 4 | 2000 × 2000 | 5.625 | 45 | 61350 | (10.72) | 66516 | (20.05) | 55409 | 12457 | (19.81) | 10397 | | 5 | 4000 × 4000 | 5.625 | 45 | 58410 | (198.39) | 58410 | (198.39) | 19575 | 78652 | (16.34) | 67603 | | 6 | 2000 × 2000 | 4 | 32 | 101785 | (75.18) | 102100 | (75.72) | 58104 | 49333 | (13.45) | 43485 | | 7 | 2000 × 2000 | 4 | 32 | 64252 | (39.49) | 75300 | (63.47) | 46063 | 51856 | (−21.57) | 66117 | | 8 | 4000 × 4000 | 4 | 32 | 148356 | (358.80) | 148420 | (358.99) | 32336 | 62008 | (43.35) | 43255 | | 9 | 4000 × 4000 | 4 | 32 | 52160 | (153.30) | 52160 | (153.30) | 20592 | 71489 | (5.77) | 67588 |
| | Average | | | | 97.61 | | 103.92 | | | 4.49 | |
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