VLSI Design

Table of Contents: 1998

  • VLSI Design -
  • Special Issue
  • Volume 6
  • - Article ID 027636

Plasma Process Modeling for Integrated Circuits Manufacturing

M. Meyyappan | T. R. Govindan
  • VLSI Design -
  • Special Issue
  • - Volume 8
  • - Article ID 085608

Advantages of Semiconductor Device Simulator Combining Electromagnetic and Electron Transport Models

S. M. Sohel Imtiaz | Samir M. El-Ghazaly | Robert O. Grondin
  • VLSI Design -
  • Special Issue
  • - Volume 8
  • - Article ID 023567

Interface Roughness Effects in Ultra-Thin Tunneling Oxides

D. Z.-Y. Ting | Erik S. Daniel | T. C. Mcgill
  • VLSI Design -
  • Special Issue
  • Volume 6
  • - Article ID 096309

Lattice Effects in the Complex Subband Dispersion of 2DEG Semiconductor Waveguide Structures Subjected to a Perpendicular Magnetic Field

G. Edwards | D. K. Ferry
  • VLSI Design -
  • Special Issue
  • - Volume 7
  • - Article ID 038483

Placement and Routing for Performance-Oriented FPGA Layout

Michael J. Alexander | James P. Cohoon | ... | Gabriel Robins
  • VLSI Design -
  • Special Issue
  • Volume 6
  • - Article ID 070460

Beating in the RHEED Intensity Oscillations during Surfactant Mediated GaAs Molecular Beam Epitaxy: Process Physics and Modeling

Vamsee K. Pamula | R. Venkat
  • VLSI Design -
  • Special Issue
  • - Volume 8
  • - Article ID 039231

SPIN – A Schrödinger-Poisson Solver Including Nonparabolic Bands

H. Kosina | C. Troger
  • VLSI Design -
  • Special Issue
  • - Volume 8
  • - Article ID 081936

Transverse Patterns in the Bistable Resonant Tunneling Systems Under Ballistic Lateral Transport

V. A. Kochelap | B. A. Glavin | V. V. Mitin
  • VLSI Design -
  • Special Issue
  • Volume 6
  • - Article ID 024073

The Combination of Equipment Scale and Feature Scale Models for Chemical Vapor Deposition Via a Homogenization Technique

Matthias K. Gobbert | Timothy S. Cale | Christian A. Ringhofer
  • VLSI Design -
  • Special Issue
  • - Volume 8
  • - Article ID 035648

Transient Phenomena in High Speed Bipolar Devices

Michael S. Obrecht | Edwin L. Heasell | ... | Mohamed I. Elmasry
  • VLSI Design -
  • Special Issue
  • Volume 6
  • - Article ID 065787

A Compound Semiconductor Process Simulator and its Application to Mask Dependent Undercut Etching

Masami Kumagai | Kiyoyuki Yokoyama | Satoshi Tazawa
  • VLSI Design -
  • Special Issue
  • Volume 6
  • - Article ID 019402

Hierarchical Process Simulation for Nano-Electronics

Robert W. Dutton | Edwin C. Kan
  • VLSI Design -
  • Special Issue
  • - Volume 8
  • - Article ID 078272

Optical and Electronic Properties of Semiconductor 2D Nanosystems: Self-consistent Tight-binding Calculations

Andrea Reale | Aldo Di Carlo | ... | Paolo Lugli
  • VLSI Design -
  • Special Issue
  • - Volume 8
  • - Article ID 030974

Inclusion of Bandstructure and Many-Body Effects in a Quantum Well Laser Simulator

F. Oyafuso | P. von Allmen | ... | K. Hess
  • VLSI Design -
  • Special Issue
  • Volume 6
  • - Article ID 062125

Surface Evolution During Semiconductor Processing

Ganesh Rajagopalan | Vadali Mahadev | Timothy S. Cale

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