Editorial Board

Armin G. Aberle, National University of Singapore, Singapore
Ralf Bergmann, Bremer Institut für angewandte Strahltechnik GmbH, Germany
Xian An Cao, West Virginia University, USA
Wen-Chang Chen, National Taiwan University, Taiwan
Philippe Goldner, Ecole Nationale Supérieure de Chimie de Paris, France
Jung Y. Huang, Chiao Tung University, Taiwan
Anthony J. Kenyon, University College London, United Kingdom
Yaomin Lin, Alfred E. Mann Foundation for Scientific Research, USA
Wenning Liu, Pacific National Labs, USA
Yalin Lu, U.S. Air Force Academy, USA
Alfred Margaryan, AFO Research Inc., USA
Samir K Mondal, Central Scientific Instruments Organization, India
Satishchandra B. Ogale, National Chemical Laboratory, India
Adrian Podoleanu, The University of Kent, United Kingdom
Richard Rizk, Ecole Nationale Supérieure des Ingénieurs de Caen, France
Lucimara Stolz Roman, Universidade Federal do Paraná, Brazil
Jayanta K. Sahu, University of Southampton, United Kingdom
Somenath N. Sarkar, University of Calcutta, India
Vasily Spirin, Division de Fisica Aplicada, CICESE, Mexico
Chang Q. Sun, Nanyang Technological University, Singapore
Yuqin Zong, NIST, USA