Editorial Board

• Armin G. Aberle, National University of Singapore, Singapore
• Ralf Bergmann, Bremer Institut für angewandte Strahltechnik GmbH, Germany
• Xian An Cao, West Virginia University, USA
• Wen-Chang Chen, National Taiwan University, Taiwan
• Philippe Goldner, Ecole Nationale Supérieure de Chimie de Paris, France
• Jung Y. Huang, Chiao Tung University, Taiwan
• Anthony J. Kenyon, University College London, United Kingdom
• Yaomin Lin, Alfred E. Mann Foundation for Scientific Research, USA
• Wenning Liu, Pacific National Labs, USA
• Zong-Yuan Liu, Foshan Nationstar Optoelectronics Co. Ltd, China
• Yalin Lu, U.S. Air Force Academy, USA
• Alfred Margaryan, AFO Research Inc., USA
• Samir K Mondal, Central Scientific Instruments Organization, India
• Michele Norgia, Politecnico di Milano, Italy
• Satishchandra B. Ogale, National Chemical Laboratory, India
• Adrian Podoleanu, The University of Kent, United Kingdom
• Richard Rizk, Ecole Nationale Supérieure des Ingénieurs de Caen, France
• Lucimara Stolz Roman, Universidade Federal do Paraná, Brazil
• Jayanta K. Sahu, University of Southampton, United Kingdom
• Somenath N. Sarkar, University of Calcutta, India
• Vasily Spirin, Division de Fisica Aplicada, CICESE, Mexico
• Chang Q. Sun, Nanyang Technological University, Singapore
• Yuqin Zong, NIST, USA