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ElectroComponent Science and Technology
Volume 8 (1981), Issue 3-4, Pages 241-243
doi:10.1155/APEC.8.241
The Anomalous Properties of Polysiloxane Films
Czech Technical University, Prague, Czech Republic
Copyright © 1981 Hindawi Publishing Corporation. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
Abstract
An electron beam was used to create thin polysiloxane films from methylphenylsiloxane and the anomalous properties of permittivity and temperature dependence, the resistivity dependence on humidity and the permittivity dependence on pressure of air or argon, was examined. These anomalous properties can be potentially applicable to humidity probes, pressure gauges and for miniature capacitors.