Editorial Board

• Muthanna Al-Dahhan, Missouri university of science and technology, USA
• Miguel J. Bagajewicz, University of Oklahoma, USA
• Alfons Baiker, ETH Zurich, Switzerland
• Jerzy Bałdyga, Warsaw University of Technology, Poland
• Mostafa Barigou, University of Birmingham, United Kingdom
• Gino Baron, Vrije Universiteit Brussel, Belgium
• Hans-Jörg Bart, University of Kaiserslautern, Germany
• Subhash Bhatia, Universiti Sains Malaysia, Malaysia
• Giuseppe Caputo, Università degli Studi di Salerno, Italy
• Raghunath V. Chaudhari, The University of Kansas, USA
• Jean-Pierre Corriou, LSGC-CNRS-ENSIC, France
• Donald L. Feke, Case Western Reserve University, USA
• James J. Feng, The University of British Columbia, Canada
• Rafiqul Gani, Technical University of Denmark, Denmark
• Jinlong Gong, Tianjin University, China
• Thomas R. Hanley, Auburn University, USA
• Michael Harris, Purdue University, USA
• Kus Hidajat, National University of Singapore, Singapore
• Xijun Hu, Hong Kong University of Science and Technology, Hong Kong
• M. G. Ierapetritou, Rutgers University, USA
• Konstantinos E. Kakosimos, Texas A&M University at Qatar, Qatar
• Dilhan M. Kalyon, Stevens Institute of Technology, USA
• Kyung Aih Kang, University of Louisville, USA
• Iftekhar A. Karimi, National University of Singapore, Singapore
• Bhaskar Kulkarni, National Chemical Laboratory, India
• Deepak Kunzru, Indian Institute of Technology Kanpur, India
• Janez Levec, University of Ljubljana, Slovenia
• Jose C. Merchuk, Ben-Gurion University of the Negev, Israel
• Badie I. Morsi, University of Pittsburgh, USA
• Sohail Murad, University of Illinois at Chicago, USA
• Dmitry Murzin, Abo Akademi University, Finland
• Ahmet N. Palazoglu, University of California at Davis, USA
• Fernando T. Pinho, Universidade do Porto, Portugal
• Peter N. Pintauro, Case Western Reserve University, USA
• Doraiswami Ramkrishna, Purdue University, USA
• Alírio Rodrigues, University of Porto, Portugal
• Jose Alberto Romagnoli, Louisiana State University, USA
• Adrian Schumpe, Technical University of Braunschweig, Germany
• Moshe Sheintuch, Technion, Israel
• Evangelos Tsotsas, Otto-von-Guericke-University, Germany
• Toshinori Tsuru, Hiroshima University, Japan
• Tapio Westerlund, Åbo Akademi University, Finland
• Jaime Wisniak, Ben Gurion University of the Negev, Israel
• King Lun Yeung, The Hong Kong University of Science and Technology, Hong Kong
• Zhibing Zhang, University of Birmingham, United Kingdom