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International Journal of Photoenergy
Volume 2013 (2013), Article ID 792357, 5 pages
http://dx.doi.org/10.1155/2013/792357
Research Article

RF Magnetron Sputtering Aluminum Oxide Film for Surface Passivation on Crystalline Silicon Wafers

Institute for Solar Energy Systems, School of Engineering, Sun Yat-sen University, Guangzhou Higher Education Mega Center, Guangzhou 510006, China

Received 30 October 2012; Revised 18 December 2012; Accepted 26 December 2012

Academic Editor: Ho Chang

Copyright © 2013 Siming Chen et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

How to Cite this Article

Siming Chen, Luping Tao, Libin Zeng, and Ruijiang Hong, “RF Magnetron Sputtering Aluminum Oxide Film for Surface Passivation on Crystalline Silicon Wafers,” International Journal of Photoenergy, vol. 2013, Article ID 792357, 5 pages, 2013. doi:10.1155/2013/792357