Laser-Induced Backside Wet Etching of Transparent Materials with Organic and Metallic Absorbers
Figure 7
Submicron 2 D gratings with
periods 550 nm and 780 nm etched in fused silica,
respectively. (a) Grating obtained by H-LIBWE with a py:acetone solution and (b)
grating etched on a prepatterned substrate (line width 7.5 ,
prepattern depth 3) using mercury as absorber.
