Review Article

Applications of Compact Laser-Driven EUV/XUV Plasma Sources

Figure 8

Adaptable Kirkpatrick-Baez optics used for beam shaping, based on two cylindrical bent mirrors. Left: photograph and working principle (inset). Right: principle of mirror shaping (top), using bendable silicon wafers with a high reflectivity carbon coating for beam shaping (collimating/focusing). The resulting intensity distribution (bottom) of the focused beam shows diameters of 3 0 0 𝜇 m × 5 0 0 𝜇 m (FWHM).
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