Review Article

Magnetic Mn-Doped Ge Nanostructures

Figure 2

80 nm thick Mn-doped Ge grown on Si at 250°C, (a) as-grown film and (b) after 400°C annealing at for 30 min. Stacking faults are marked by arrows.
198590.fig.002a
(a)
198590.fig.002b
(b)