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Physics Research International
/
2012
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Article
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Tab 3
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Research Article
Development of Laser-Produced Tin Plasma-Based EUV Light Source Technology for HVM EUV Lithography
Table 3
Transient phenomena of Sn target shape with different prepulse laser pulse durations.
Units
Pulse duration
Sec
10 pico
10 nano
Pulse energy
mJ
2
2.7
Delay time between pre-pulse laser and CO
2
laser
au.
1
2
1
2
Target shape 90 deg view