International Scholarly Research Notices

Research Article

Sputter Power Influenced Structural, Electrical, and Optical Behaviour of Nanocrystalline CuNiO2 Films Formed by RF Magnetron Sputtering

Table 1

Deposition conditions fixed for the growth of CuNiO2 films.
Sputter targetCu50Ni50
Target-to-substrate distance 50 mm
Ultimate pressure 5 × 10−4 Pa
Oxygen partial pressure (pO2) 2 × 10−2 Pa
Sputtering pressure4 Pa
Substrate temperature 523 K
Sputter power ( ) 3.1–6.1 W/cm2