Research Article

Optical Emission Spectroscopic Analysis of Plasma Plume during Pulsed Laser Deposition of PZT

Figure 9

The XRD pattern of PZT thin films deposited at different pressures  mbar to 0.1 mbar ((a) to (d)) and then annealed at 750°C and 500°C and (e) at 600°C ( represents the pyrochlore phase and * represents substrate).
125843.fig.009a
(a)
125843.fig.009b
(b)
125843.fig.009c
(c)
125843.fig.009d
(d)
125843.fig.009e
(e)