Journal of Nanoscience

Research Article

Microstructural and Electrochemical Properties of rf-Sputtered LiFeO2 Thin Films

Figure 2

SEM images of LiFeO2 films (a) as-deposited and annealed at (b) = 300°C, (c) = 400°C, and (d) = 500°C.
173845.fig.002