International Scholarly Research Notices

Research Article

Characterization of Silver Oxide Films Formed by Reactive RF Sputtering at Different Substrate Temperatures

Figure 6

AFM 3d- and 2d-micrographs of Ag2O films formed at substrate temperatures: (a) 303 K, (b) 423 K, and (c) 473 K.
684317.fig.006a
(a)
684317.fig.006b
(b)
684317.fig.006c
(c)