Research Article
Generation Control of ZnO Nanoparticles Using a Coaxial Gas-Flow Pulse Plasma Ar/O2 Plasma
Figure 10
Variation of particle size and density as a function of total gas flow rate. Applied voltage is −650 V for 30 min deposition with flow rate ratio of Ar/O2 being 1/1. Total pressure is fixed at 30 Pa by changing the pumping speed.