Research Article
Generation Control of ZnO Nanoparticles Using a Coaxial Gas-Flow Pulse Plasma Ar/O2 Plasma
Figure 7
SEM images of particles deposited on Si substrate with applied voltage as a parameter. Flow rate ratio of Ar/O2 is 25 sccm/25 sccm for 30 min deposition.
(a) |
(b) |
(c) |