Delocalized Photomechanical Effects of UV ns Laser Ablation on Polymer Substrates Captured by Optical Holography Workstation: An Overview on Experimental Result

<div>Defect formation versus number of pulses of neat PMMA at 193 nm.</div>

Advances in Optics

fig2

Figure 2

Figure 2: Delocalized Photomechanical Effects of UV ns Laser Ablation on Polymer Substrates Captured by Optical Holography Workstation: An Overview on Experimental Result 

Figure 2 | Delocalized Photomechanical Effects of UV ns Laser Ablation on Polymer Substrates Captured by Optical Holography Workstation: An Overview on Experimental Result 