Impact of Nanograting Phase-Shift on Light Absorption
Enhancement in Plasmonics-Based Metal-Semiconductor-Metal
Photodetectors
Figure 1
Typical SEM images of the metal nanogratings fabricated with FIB milling process for an estimated (predesigned/selected) sub-wavelength width of 100 nm. (a) Nanograting phase shift is (145–100) nm = 45 nm (~20°) and (b) nanograting phase shift is (168–100) nm = 68 nm (~31°).
