Realization of Ultraflat Plastic Film Using Dressed-Photon-Phonon-Assisted Selective Etching of Nanoscale Structures

Figure 2

Typical AFM images of PMMA substrate (a) before and (b) after DPP etching using He-Cd laser ( nm, 3.81 eV). Typical AFM images of PMMA substrate (c) before and (d) after conventional photochemical etching using 5th-harmonic YAG laser ( nm, 5.82 eV).

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(b)

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