Characterization of the Chemical Kinetics in an O<sub><b>2</b></sub>/HMDSO RF Plasma for Material Processing

<table>Major ion and neutral species concentration in the gas phase as a function of the O<sub>2</sub>/HMDSO ratio (● plasma on, ∘ plasma off). </table>

Advances in Physical Chemistry

fig7

Figure 7

Figure 7: Characterization of the Chemical Kinetics in an O<sub><b>2</b></sub>/HMDSO RF Plasma for Material Processing 

Advances in Physical Chemistry

Characterization of the Chemical Kinetics in an O2/HMDSO RF Plasma for Material Processing

Figure 7

Characterization of the Chemical Kinetics in an O₂/HMDSO RF Plasma for Material Processing