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Advances in Physical Chemistry
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Special Issues
Advances in Physical Chemistry
/
2012
/
Article
/
Fig 8
/
Research Article
Characterization of the Chemical Kinetics in an O
2
/HMDSO RF Plasma for Material Processing
Figure 8
Water contact angle measured on different plasma-treated substrate samples as a function of the O
2
/HMDSO ratio (
W,
Pa, and
).