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Advances in Physical Chemistry
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Special Issues
Advances in Physical Chemistry
/
2012
/
Article
/
Fig 9
/
Research Article
Characterization of the Chemical Kinetics in an O
2
/HMDSO RF Plasma for Material Processing
Figure 9
SEM image of the film deposited on silicon (
W,
Pa, O
2
/HMDSO = 7.5, and
).