Table of Contents
Conference Papers in Energy
Volume 2013, Article ID 718692, 7 pages
Conference Paper

ZnO Thin Film Deposition for TCO Application in Solar Cell

Facilitation Centre for Industrial Plasma Technologies (FCIPT), Institute for Plasma Research (IPR), Gandhinagar Plot No. A-10/B, Electronic Estate, GIDC, Sector 25, Gandhinagar, Gujarat 382044, India

Received 5 January 2013; Accepted 3 April 2013

Academic Editors: P. Agarwal, B. Bhattacharya, U. P. Singh, and B. Sopori

This Conference Paper is based on a presentation given by S. Agrawal at “International Conference on Solar Energy Photovoltaics” held from 19 December 2012 to 21 December 2012 in Bhubaneswar, India.

Copyright © 2013 S. Agrawal et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

Linked References

  1. A. V. Singh, M. Kumar, R. M. Mehra, A. Wakahara, and A. Yoshida, “Al-doped zinc oxide (ZnO:Al) thin films by pulsed laser ablation,” Journal of the Indian Institute of Science, vol. 81, no. 5, pp. 527–533, 2001. View at Google Scholar · View at Scopus
  2. K. Ellmer, F. Kudella, R. Mientus, R. Schieck, and S. Fiechter, “Influence of discharge parameters on the layer properties of reactive magnetron sputtered ZnO:Al films,” Thin Solid Films, vol. 247, no. 1, pp. 15–23, 1994. View at Google Scholar · View at Scopus
  3. K. Ellmer and R. Wendt, “D.c. And r.f. (reactive) magnetron sputtering of ZnO:Al films from metallic and ceramic targets: a comparative study,” Surface and Coatings Technology, vol. 93, no. 1, pp. 21–26, 1997. View at Google Scholar · View at Scopus