Conference Paper

ZnO Thin Film Deposition for TCO Application in Solar Cell

Table 3

Results of films after annealing treatment.

After annealing at 300°C for 2 Hrs in vacuum (2 × 10−5 mBar)
Sample IDSheet resistance of the filmThickness of filmResistivity of the filmTransparency of the filmBand gap of the film
UnitnmΩ · cm%eV

A0.06166501.81 × 10−384.23.19
B0.0418301.54 × 10−380.83.2
C0.4575801.20 × 10−285.93.2
D0.09036402.62 × 10−374.23.1
E0.04456451.30 × 10−3613.18