Table of Contents
Conference Papers in Science
Volume 2014, Article ID 683219, 5 pages
http://dx.doi.org/10.1155/2014/683219
Conference Paper

NO2 Sensing Properties of WO3 Thin Films Deposited by Rf-Magnetron Sputtering

1Department of Physics and Astrophysics, University of Delhi, Delhi 110007, India
2Department of Applied Physics, Delhi Technological University, Delhi 110042, India
3Physics Department, Miranda House, University of Delhi, Delhi 110007, India

Received 8 February 2014; Accepted 11 March 2014; Published 10 April 2014

Academic Editors: P. Mandal, R. K. Shivpuri, and G. N. Tiwari

This Conference Paper is based on a presentation given by Savita Sharma at “National Conference on Advances in Materials Science for Energy Applications” held from 9 January 2014 to 10 January 2014 in Dehradun, India.

Copyright © 2014 Savita Sharma et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

Abstract

Tungsten trioxide (WO3) thin films were deposited by Rf-magnetron sputtering onto Pt interdigital electrodes fabricated on corning glass substrates. NO2 gas sensing properties of the prepared WO3 thin films were investigated by incorporation of catalysts (Sn, Zn, and Pt) in the form of nanoclusters. The structural and optical properties of the deposited WO3 thin films have been studied by X-ray diffraction (XRD) and UV-Visible spectroscopy, respectively. The gas sensing characteristics of all the prepared sensor structures were studied towards 5 ppm of NO2 gas. The maximum sensing response of about 238 was observed for WO3 film having Sn catalyst at a comparatively lower operating temperature of 200°C. The possible sensing mechanism has been highlighted to support the obtained results.