Table of Contents
Indian Journal of Materials Science
Volume 2013, Article ID 684730, 7 pages
http://dx.doi.org/10.1155/2013/684730
Research Article

Preparation and Characterization of R.F. Magnetron Sputtered Mo:ZnO Thin Films

1Department of Science and Humanities, Vignan University, Vadlamudi, Andhra Pradesh 522 213, India
2Postgraduate Department of Physics and Electronics, P.B. Siddhartha College of Arts and Science, Vijayawada, Andhra Pradesh 520 010, India
3Laboratory for Condensed Matter Physics, Satyendra Nath Bose National Centre for Basic Sciences, Salt Lake, Kolkata 700 098, India

Received 17 June 2013; Accepted 31 July 2013

Academic Editors: K. Kalantar-Zadeh and H. Leiste

Copyright © 2013 K. Srinivasarao et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

How to Cite this Article

K. Srinivasarao, G. Srinivasarao, K. V. Madhuri, K. Krishna Murthy, and P. K. Mukhopadhyay, “Preparation and Characterization of R.F. Magnetron Sputtered Mo:ZnO Thin Films,” Indian Journal of Materials Science, vol. 2013, Article ID 684730, 7 pages, 2013. https://doi.org/10.1155/2013/684730.