Indian Journal of Materials Science / 2013 / Article / Fig 5

Research Article

Preparation and Characterization of R.F. Magnetron Sputtered Mo:ZnO Thin Films

Figure 5

FIBSEM micrographs of Mo(1.5%):ZnO films deposited at a sputtering pressure of 1 × 10−2 mbar and at a substrate temperature of 473 K.
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