Preparation and Characterization of R.F. Magnetron Sputtered Mo:ZnO Thin Films

<div class="floats-full-page floats-full-page-figure"><h2>Figure 7</h2><div class="floats-full-page-caption"><table>Optical transmittance spectra of Mo:ZnO thin films deposited at a sputtering  pressure of 1 × 10<sup>−2</sup> mbar and at a substrate temperature of 673 K.</table></div><div class="floats-full-page-content"><table class="table-group" width="800px"><tr class="fig-image"><td><img alt="684730.fig.007" src="https://static-01.hindawi.com/articles/ijms/volume-2013/684730/figures/684730.fig.007.jpg" /></td></tr></table></div></div>

Figure 7 | Preparation and Characterization of R.F. Magnetron Sputtered Mo:ZnO Thin Films

title

Figure 7: Preparation and Characterization of R.F. Magnetron Sputtered Mo:ZnO Thin Films

description

Figure 7

About this journal

Journal profile

Meet the editorial board

Editor spotlight

Find out more

This journal's articles appear in a wide range of abstracting and indexing databases, and are covered by numerous other services that aid discovery and access. Find out more about where and how the content of this journal is available.

Indian Journal of Materials Science

Preparation and Characterization of R.F. Magnetron Sputtered Mo:ZnO Thin Films

Figure 7