Indian Journal of Materials Science / 2013 / Article / Tab 1

Research Article

Preparation and Characterization of R.F. Magnetron Sputtered Mo:ZnO Thin Films

Table 1

EDAX data of Mo:ZnO films.

Atomic percent of Mo in ZnOSputtering pressure = 1 × 10−2 mbar,
= 473 K
At.% of oxygenAt.% of zincAt.% of molybdenum

Mo(0%):ZnO45.7154.290
Mo(1.5%):ZnO46.452.111.48
Mo(2%):ZnO
46.8151.042.15