Preparation and Characterization of R.F. Magnetron Sputtered Mo:ZnO Thin Films

<div class="floats-full-page floats-full-page-other"><h2>Table 1</h2><div class="floats-full-page-caption">EDAX data of Mo:ZnO films.</div><div class="floats-full-page-content"><table class="table-group" id="tab1"><tr><td><table class="table"><tr><td class="thead-hr" colspan="4"><hr /></td></tr><tr class="thead"><td align="left" rowspan="3">Atomic percent of Mo in ZnO</td><td align="center" colspan="3">Sputtering pressure = 1 × 10<sup>−2</sup> mbar, </td></tr><tr class="thead"><td align="center" colspan="3"><svg height="15.8375" id="M7" style="vertical-align:-3.39066pt" version="1.1" viewbox="0 0 16.525 15.8375" width="16.525" xmlns="http://www.w3.org/2000/svg" xmlns:xlink="http://www.w3.org/1999/xlink">
<g transform="matrix(.017,-0,0,-.017,.062,11.55)"><path d="M649 676l-22 -187l-33 -2q3 56 -12 94q-8 20 -31.5 26.5t-86.5 6.5h-74l-90 -491q-4 -23 -6 -36.5t1 -25t7 -16.5t18 -9t27 -5t41 -3l-6 -28h-286l4 28q68 5 84 18.5t28 76.5l94 491h-55q-74 0 -100.5 -6t-41.5 -23q-24 -29 -54 -98l-32 1q32 98 53 188h22q7 -18 15 -22&#10;t37 -4h417q23 0 33.5 5t25.5 21h23z" id="x1D447"></path></g>
<g transform="matrix(.012,-0,0,-.012,11.388,15.637)"><path d="M352 391q0 -31 -27 -44q-14 -7 -24 6q-39 48 -84 48q-23 0 -39.5 -15t-16.5 -40q0 -43 73 -90q49 -32 70 -58t21 -57q0 -58 -62 -105.5t-129 -47.5q-40 0 -75.5 25t-35.5 52q0 28 32 46q7 4 15 3t11 -6q19 -31 48.5 -50.5t54.5 -19.5q34 0 54 19.5t20 42.5q0 43 -65 81&#10;q-97 56 -97 123q0 50 51 96q19 17 58 32.5t62 15.5q37 0 61 -18t24 -39z" id="x1D460"></path></g>
</svg> = 473 K</td></tr><tr class="thead"><td align="center">At.% of oxygen</td><td align="center">At.% of zinc</td><td align="center">At.% of molybdenum</td></tr><tr><td class="thead-hr" colspan="4"><hr /></td></tr><tr><td align="left">Mo(0%):ZnO</td><td align="center">45.71</td><td align="center">54.29</td><td align="center">0</td></tr><tr><td align="left">Mo(1.5%):ZnO</td><td align="center">46.4</td><td align="center">52.11</td><td align="center">1.48</td></tr><tr><td align="left">Mo(2%):ZnO<br /></td><td align="center">46.81</td><td align="center">51.04</td><td align="center">2.15</td></tr><tr class="table-tr"><td colspan="4"><hr class="tbody-hr" /></td></tr></table></td></tr></table></div></div>

Table 1 | Preparation and Characterization of R.F. Magnetron Sputtered Mo:ZnO Thin Films

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Table 1: Preparation and Characterization of R.F. Magnetron Sputtered Mo:ZnO Thin Films

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Table 1

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Indian Journal of Materials Science

Preparation and Characterization of R.F. Magnetron Sputtered Mo:ZnO Thin Films

Table 1