A New Process for On-Chip Inductors with High Q-Factor Performance
Figure 2
(a) Schematic cross-section of inductor with supporting pillars in all metal layers, resist mask for oxide etching. (b) Schematic cross-section of inductor after 1st step oxide removal by anisotropic oxide etch. (c) Schematic cross-section of inductor after 2nd step oxide removal by isotropic oxide etch. (d) Layer thicknesses of oxide and metal.
