A New Process for On-Chip Inductors with High Q-Factor Performance
Figure 8
(a) Series inductance of benchmark, standard, and under-etching processed for typical inductor with outer diameter 213 m, inductance nH. (b) Series resistance of THRU deembedding structure versus frequency; = 168 mΩ extracted at very low frequency (200 MHz). (c) Series inductance of THRU deembedding structure versus frequency; = 138 pH extracted at very low frequency (200 MHz).
