A New Process for On-Chip Inductors with High <i>Q</i>-Factor Performance

<table>Comparison of <svg height="15.65" id="M146" style="vertical-align:-3.3907pt" version="1.1" viewbox="0 0 39.950001 15.65" width="39.950001" xmlns="http://www.w3.org/2000/svg" xmlns:xlink="http://www.w3.org/1999/xlink">
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</svg> for standard and under-etched processed coils.</table>

International Journal of Microwave Science and Technology

fig9

Figure 9

Figure 9: A New Process for On-Chip Inductors with High <i>Q</i>-Factor Performance 

International Journal of Microwave Science and Technology

A New Process for On-Chip Inductors with High Q-Factor Performance

Figure 9